| Code | Application | Attribute | Product Name | Chemical Equation | Packaging Method | Level | MSDS | COA | Stocking address |
|---|---|---|---|---|---|---|---|---|---|
| 004009 | Semiconductor Industry | GAS | Chlorine gas | CL2 | Cl2: 99.999% | MSDS | COA | ||
| 004010 | Semiconductor Industry | GAS | Boron trichloride | BCl3 | BCl3:99.999% | MSDS | COA | ||
| 004011 | Semiconductor | Liquid | Hydrogen peroxide | H2O2 | H2O2: 30.0%, water70% | MSDS | COA | ||
| 004012 | Semiconductor Industry | Liquid | Ammonia solution | NH3 | NH3:25.0%,water75% | MSDS | COA | ||
| 004013 | Semiconductor Industry | Liquid | Formic acid | HCOOH | MSDS | COA | |||
| 004014 | Semiconductor Industry | GAS | Phosphine | PH3 | MSDS | COA | |||
| 004015 | Semiconductor Industry | Liquid | phosphoric acid | H₃PO₄ | MSDS | COA | |||
| 004016 | Semiconductor Industry | Liquid | Ammonia sulfide | (NH4)2S | MSDS | COA | |||
| 004017 | Semiconductor Industry | Liquid | Bromine | Br2 | MSDS | COA | |||
| 004018 | Semiconductor Industry | Liquid | methanol | CH3OH | MSDS | COA | |||
| 004019 | Semiconductor Industry | Liquid | Hypochlorous acid | HClO | MSDS | COA | |||
| 004020 | Semiconductor Industry | Liquid | acetic acid | CH3COOH | MSDS | COA | |||
| 004021 | Semiconductor Industry | GAS | Sulfur hexafluoride | SF6 | SF6:99.999% | MSDS | COA | ||
| 004022 | Semiconductor Industry | GAS | Trifluoromethane | CHF3 | CHF3: 99.999% | MSDS | COA | ||
| 004023 | Semiconductor Industry | GAS | Carbon tetrafluoride | CF4 | MSDS | COA | |||
| 004024 | Semiconductor Industry | GAS | Octafluorocyclobutane | C4F8 | MSDS | COA | |||
| 004025 | Semiconductor Industry | Liquid | Tetramethylammonium hydroxide | TMAH | MSDS | COA | |||
| 004026 | Semiconductor Industry | Liquid | ammonium fluoride | NH₄F | NH₄F:40%, H2O 60% | MSDS | COA | ||
| 004027 | Semiconductor Industry | Liquid | Resin Matrix Composite | MSDS | COA | ||||
| 004028 | Semiconductor Industry | Liquid | Amines curing agents | C5H12FNO | MSDS | COA | |||
| 004029 | Semiconductor Industry | Solid | Sodium hypochlorite | NaClO | MSDS | COA | |||
| 004030 | Semiconductor Industry | Solid | sodium dichloroisocyanurate | C3Cl2N3NaO3 | MSDS | COA | |||
| 004031 | Semiconductor Industry | Solid | Citric Acid | C6H8O7 | MSDS | COA | |||
| 004032 | Semiconductor Industry | Solid | Tartaric acid | C4H6O6 | MSDS | COA | |||
| 004033 | Semiconductor Industry | Liquid | Ethylene glycol | HOCH2—CH2OH | MSDS | COA | |||
| 004034 | Semiconductor Industry | Liquid | Fatty alcohol polyoxyethylene ether | RO(CH2CH2O)nH | MSDS | COA | |||
| 004035 | Semiconductor Industry | Solid | sodium bicarbonate | NaHCO3 | MSDS | COA | |||
| 004036 | Semiconductor Industry | Liquid | NMP | N-Methylpyrrolidone 99.5% | MSDS | COA | |||
| 004037 | Semiconductor Industry | Liquid | PAC10% | [Al2(OH)nCl6-n]m | MSDS | COA | |||
| 004038 | Semiconductor Industry | Liquid | PAM | MSDS | COA | ||||
| 004039 | Semiconductor Industry | Liquid | stripping solution | MSDS | COA | ||||
| 004040 | Semiconductor Industry | Liquid | Degreaser | 1-Methoxy-2-propanol: 60-80%; Propylene glycol methyl ether acetate: 20-40% | MSDS | COA | |||
| 004041 | Semiconductor Industry | Liquid | Carbon tetrafluoride | CF4 | MSDS | COA | |||
| 004042 | Semiconductor Industry | Liquid | Tetramethylammonium hydroxide aqueous solution | MSDS | COA | ||||
| 004043 | Semiconductor Industry | 液态 | HMDS Adhesion Promoter | MSDS | COA | ||||
| 004044 | Semiconductor Industry | Liquid | Isopropanol | C3H8O | 99.7% | MSDS | COA | ||
| 004045 | Semiconductor Industry | Liquid | Polishing solution | Silicon dioxide (20%-30%), SC-605N cleaning agent, and water | MSDS | COA | |||
| 004046 | Semiconductor Industry | Liquid | Developer | MSDS | COA | ||||
| 004047 | Semiconductor Industry | GAS | Hydrogen | H2 | H2:99.9999% | MSDS | COA | ||
| 004048 | Semiconductor Industry | GAS | Helium | He2 | He: 99.9999% | MSDS | COA | ||
| 004049 | Semiconductor Industry | GAS | Oxygen | O2 | O2: 99.999% | MSDS | COA | ||
| 004050 | Semiconductor Industry | GAS | Argon | Ar | Ar: 99.9999% | MSDS | COA | ||
| 004051 | Semiconductor Industry | GAS | Nitrogen | N2 | N2: 99.9999% | MSDS | COA | ||
| 004052 | Semiconductor Industry | Solid | Calcium chloride | CaCl2 | MSDS | COA | |||
| 004053 | Semiconductor Industry | GAS | Methane | CH4 | CH4: 99.999% | MSDS | COA | ||
| 004054 | Semiconductor Industry | Solid | Paraffin wax | MSDS | COA | ||||
| 004055 | Semiconductor Industry | Liquid | grinding fluid | 17% silica, 6% organic alkali | MSDS | COA | |||
| 004056 | Semiconductor Industry | GAS | Silane | SiH4 | SiH4: >95% | MSDS | COA | ||
| 004057 | Semiconductor Industry | GAS | Nitrous oxide | N2O | N2O: 99.999% | MSDS | COA | ||
| 004058 | Semiconductor | Liquid | TMA | C3H9Al | C3H9Al: 99.999% | MSDS | COA |